As we know, optical films have wide applications in the electronic industry. And there are many kinds of movies for different uses. Our company Daken Chemical is a professional electronic chemicals supplier, and  material supplier of optical thin films; in this post, we will share three ways to produce the optical thin films.
The use of anti-reflection film can reduce the luminous flux loss of complex optical lenses ten times; the use of high reflectance mirrors can double the output power of the laser; the use of optical thin films can improve the efficiency and stability of silicon photocells. Ok. let’s check the 1st way.

Physical Vapor Deposition (PVD)

PVD requires the use of a vacuum coating machine, which has high manufacturing costs, but the thickness of the film can be accurately controlled, and the film strength is good. It has been widely used. According to the different vaporization methods of the film material, the PVD method is divided into thermal evaporation, Sputtering, ion plating, and ion-assisted plating technology.

Physical Vapor Deposition
Below are the four different ways:

1.Thermal evaporation

In the vacuum chamber, the raw material to be formed into the film in the evaporation container is heated so that its atoms or molecules vaporize and escape from the surface to start a vapor stream, which is incident on the surface of a solid (called a substrate or a substrate) and condenses to form a solid film.

2. Sputtering

Sputtering refers to bombarding the surface of the film material with high-speed positive ions. Through momentum transfer, the molecules or atoms obtain sufficient kinetic energy to escape from the target surface (Sputtering) and condense into a film on the surface of the plated part.

3. Ion plating

Ion plating has both the high film formation rate of thermal evaporation and the double-benefit effect of dense film layer by sputtering high-energy ion bombardment. The ion plating layer has strong adhesion and compactness—common types of ion plating: evaporation source and ionization method.

Chemical vapor deposition

Chemical vapor deposition is a technology that uses gaseous precursor reactants to generate solid thin films through chemical reactions between atoms and molecules.
CVD generally requires a higher deposition temperature and requires specific precursor reactants before film preparation. Some by-products such as flammable and toxic are also produced during the film preparation process. However, the deposition rate of films prepared by CVD technology is generally higher.

Chemical vapor deposition

Chemical liquid deposition

The CLD process is simple, and the manufacturing cost is low. Still, the film thickness cannot be accurately controlled. The film strength is poor. It isn’t easy to obtain a multilayer film. There is also a pollution problem caused by wastewater and waste gas, which has been rarely used.

About Daken Chemical 

Henan Daken Chemical Co.,Ltd was Established in June ,1983.We have a 38 years history for fine chemical synthesis. Our main products include performance materials, custom synthesis, for more products please visit:

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