The photoresist monomer is a vital component used to precisely pattern silicon wafers in the semiconductor industry. The success of the manufacturing process can be greatly impacted by choosing the appropriate photoresist monomer supplier. In order to give readers a clear understanding of the significance of selecting a trustworthy photoresist monomer supplier, check this photoresist monomer process from Dakenchem. We are a reputable and experienced supplier of fine chemical solutions.

Photoresist Monomer Process
Photoresist Monomer Process

What kinds of photoresist are there?

It’s important to be aware of the various varieties of photoresist available on the market if you’re interested in photoresist technology. The most popular photoresists are IC photoresist (for semiconductors), PCB photoresist (for printed circuit boards), and panel photoresist.

The IC photoresist category is divided further into various types such as G-line photoresist, I-line photoresist, KRF photoresist, Arf photoresist, and EUV photoresist, each with specific properties for different semiconductor manufacturing processes.

Understanding these different types can help you choose the right photoresist for your specific needs, whether you’re a professional in the industry or an enthusiast looking to learn more.

Photoresist monomer for different photoresist types?

One of the critical factors affecting the photoresist’s performance is the photoresist monomer. Different types of photoresist require different photoresist monomers to achieve optimal performance.

For instance, G-line photoresists require monomers that are highly transparent to G-line light and have high thermal stability. I-line photoresists require monomers that have high sensitivity to I-line light, while KRF photoresists require monomers that can withstand high-energy ArF laser exposure.

ArF photoresists require monomers with high transparency to ArF light and excellent etching resistance, and EUV photoresists need high sensitivity and stability to extreme ultraviolet (EUV) light. By selecting the right photoresist monomer specific to each photoresist type, semiconductor manufacturers can ensure high-performance output.

The Performance parameters of photoresist monomers

The performance of photoresist monomers is measured by various parameters, including purity, water, acid value, and metal ion content. Different monomers have varying yields when converted into resin.

For instance, KrF monomer has a high yield of about 0.8-0.9 tons of resin per 1 ton of monomer, while ArF monomer has a lower yield of about 0.5-0.6 tons of resin per 1 ton of monomer. The resin content in KrF and ArF photoresist is generally between 10%-20%.

Hence, 1.5 tons of resin can make up to 15 tons of photoresist. Understanding these performance indices is crucial when selecting the right photoresist monomer for different applications.

The Photoresist monomer synthesis and purification

Synthesizing and purifying photoresist monomer is a complex and demanding process. The synthesis process requires the use of various chemical reactions, such as esterification, amidation, and Claisen condensation,. This process can produce numerous by-products that must be removed through purification.

The desired photoresist monomer is isolated and purified using chromatography, crystallisation, and other purification techniques. To be used in the semiconductor manufacturing process, the final photoresist monomer product must adhere to strict quality requirements. Professionals with extensive knowledge of fine chemical synthesis and purification methods synthesise photoresist monomers under controlled conditions to ensure the highest quality.

Dakenchem stands out from the competition when it comes to premium photoresist monomers. Dakenchem has more than 40 years of experience in the fine chemical synthesis sector and focuses on offering photoresist monomers of the highest calibre and dependability.

The monomers are synthesised and purified by their highly skilled team using cutting-edge technology, guaranteeing that the finished product satisfies the exacting quality standards required for use in the semiconductor industry. Dakenchem is a great partner for anyone needing photoresist monomers for their semiconductor manufacturing requirements because of their commitment to quality and customer satisfaction.

Related Posts

Photoresist Resin : The Semiconductor Photoresist Core Raw Material

Photoresist Monomer For Semiconductor From Supplier Dakenchem

Photoresist Components : A Comprehensive Guide For You

Positive Photoresist : The Material for Modern Electronics Manufacturing

Our Company Video

Contact us

To learn more about our Photoresist Monomers , get in touch with us right away!

Follow Dakenchem on Linkedin