Photoresist Monomer
Showing 1–12 of 51 results
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Perfomance Materials
CAS NO.1004549-78-3 2-propenonic acid,2-Methyl(-,1,1-diMethylpentyl) ester
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Perfomance Materials
CAS NO.110726-28-8 a,a,a’-Tris(4-hydroxyphenyl)-1-ethyl-4-isopropylbenzene
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Perfomance Materials
CAS NO.1143-72-2 phenyl(2,3,4-trihydroxyphenyl)-methanon
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Perfomance Materials
CAS NO.1149760-04-2 2-Propenoic acid, 2-methyl-, 1-(1-methylethyl)cyclopentyl ester
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Photoresist Monomer
CAS NO.115522-15-1 2-Propenoic acid, 2-methyl-, 3,5-dihydroxytricyclo[3.3.1.13,7]dec-1-yl este
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Perfomance Materials
CAS NO.1195529-37-3 Benzoic acid, 4-ethenyl-, 1-methylpropyl ester
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Perfomance Materials
CAS NO.1227868-40-7 2-Propenoic acid, 2-methyl-, 1-phenylcyclopentyl ester
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Perfomance Materials
CAS NO.1268257-44-8 2-methyl-2-(trifluoromethylsulfonamido)propyl methacrylate
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Perfomance Materials
CAS NO.130224-95-2 beta-Methacryloyloxy-gamma-butyrolactone
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Perfomance Materials
CAS NO.141714-82-1 4,7-Methano-1H-isoindole-1,3(2H)-dione, 3a,4,7,7a-tetrahydro-2-[[(4-methylphenyl)sulfonyl]oxy]-
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