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CAS NO.156938-09-9 (5-Oxotetrahydrofuran-2-yl)methyl methacrylate |
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Product Name |
(5-Oxotetrahydrofuran-2-yl)methyl methacrylate |
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Synonyms |
(5-Oxotetrahydrofuran-2-yl)methylmethacrylate;2-Propenoicacid,2-methyl-,(tetrahydro-5-oxo-2-furanyl)methylester;(5-0xotetrahydrofuran-2yl)methylmethacrylate;(Tetrahydro-5-oxo-2-furanyl)methyl2-methyl-2-propenoate |
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CAS NO. |
156938-09-9 |
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MF |
C9H12O4 |
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MW |
184.19 |
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Capacity |
Make to order |
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Storage |
Preserve in a well-closed container and keep in cool, dry place, avoid light. |
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Package |
In fluoride bottle/ Fluoride drums/iron drums/plastic drums/IBC Tank ,etc. |
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Shipment method |
By Sea, Air, Courier door to door, etc. |
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Loading Port |
China any port, Beijing, Shanghai, Hong Kong etc. |
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Application |
Photoresist |
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Contact |
Name :Mr.Benson Han E-mail :inquiry@dakenchem.com |
Frequently Asked Questions：
FAQ 1: What is (5-Oxotetrahydrofuran-2-yl)methyl methacrylate used for?
(5-Oxotetrahydrofuran-2-yl)methyl methacrylate (CAS NO. 156938-09-9) is a functional methacrylate monomer primarily used in the development of advanced polymer materials, particularly photoresist formulations for semiconductor and electronic applications. Its methacrylate group provides polymerizability, while the lactone-containing structure can introduce polarity and specific dissolution characteristics into polymer chains.
FAQ 2: Why is CAS NO. 156938-09-9 suitable for photoresist materials?
CAS NO. 156938-09-9 contains a methacrylate polymerizable group and a polar lactone structure. When incorporated into a copolymer, these structural features can help adjust the polymer’s polarity, solubility, adhesion, and film properties. Therefore, it can serve as a functional monomer for designing chemically amplified photoresist resins, particularly for advanced lithography applications.
FAQ 3: What are the key characteristics of (5-Oxotetrahydrofuran-2-yl)methyl methacrylate?
The key structural characteristics of (5-Oxotetrahydrofuran-2-yl)methyl methacrylate are its polymerizable methacrylate group and five-membered lactone ring. The combination provides a useful balance between polymerizability and polarity, making this monomer suitable for incorporating lactone functionality into specialty polymers and photoresist resin systems. Its molecular formula is C₉H₁₂O₄ and its molecular weight is 184.19 g/mol.
Application Cases
Application Case 1: Advanced Photoresist Materials
CAS NO. 156938-09-9 can be incorporated as a functional monomer into photoresist polymers. The methacrylate functionality enables copolymerization with other monomers, while the lactone structure introduces polar functionality into the polymer backbone or side chain. This makes it useful for tailoring dissolution behavior, film adhesion, and other critical properties of advanced photoresist materials. It is commercially listed as a photoresist material for electronic applications.
Application Case 2: Chemically Amplified Photoresist Resin Design
In chemically amplified photoresist systems, CAS NO. 156938-09-9 can be used as a polar lactone-containing monomer to modify the properties of photoresist polymers. Its incorporation can contribute to controlling polymer polarity and developer-solubility behavior, while the methacrylate group allows it to participate in copolymerization with other functional monomers. This makes it a useful building block for the development of high-performance photoresist resin systems.
